Entegris Clarilite® Reticle Haze Prevention System

Entegris, Inc.
0
1193

The first comprehensive solution to help semiconductor manufacturers address the quality and cost issues associated with reticle haze in 193 nm lithography. Fabs that implement the solution often realize a 4 to 5x increase in meantime between reticle cleanings, providing a dramatic savings in both time and money.

Published by: Entegris, Inc. Published at: 13 years ago Category: علمی و تکنولوژی
RSP3 reticle pod RSPX purge station Aeronex® XCDA® system dideo دیدئو reticle haze دیدئو dideo solution entegris clarilite® prevention system comprehensive help semiconductor manufacturers address quality cost issues associated lithographyfabs implement realize increase cleanings providing dramatic savings time